Category: Press Releases

Quantexa Announces General Availability of Quantexa Unify for Microsoft Fabric Leave a reply AI-powered integration seamlessly delivers unified, trusted data for analytics and decision-making within the Microsoft Fabric platform LONDON, Nov. 18, 2025 (GLOBE NEWSWIRE) — Quantexa, the global pioneer in Decision Intelligence (DI), today announced the general availability of Quantexa Unify for Microsoft Fabric, marking a major milestone in helping enterprises build connected, high-quality data estates to unlock the full potential of analytics and AI. Quantexa Unify for Microsoft Fabric is available now on the Microsoft Marketplace. For decades, organizations have sought to create a complete Enterprise 360 view, a

International Air Chiefs Gather for the 12th DIACC in Dubai Leave a reply His Excellency Mohamed bin Mubarak bin Fadhel Al Mazrouei, UAE Minister of State for Defence Affairs, inaugurated the 12th edition of the Dubai International Air Chiefs Conference. DUBAI, United Arab Emirates, Nov. 18, 2025 (GLOBE NEWSWIRE) — Under the patronage of His Highness Sheikh Mohammed bin Rashid Al Maktoum, Vice President and Prime Minister of the UAE and Ruler of Dubai, His Excellency Mohamed bin Mubarak bin Fadhel Al Mazrouei, UAE Minister of State for Defence Affairs, inaugurated the 12th edition of the Dubai International Air Chiefs

ROTTERDAM, The Netherlands, Nov. 18, 2025 (GLOBE NEWSWIRE) — Nearfield Instruments, the leader in 3D, non-destructive, in-line process control solutions based on scanning probe technology, today announced a strategic development project to accelerate innovation in semiconductor metrology. As part of a multi-year collaboration, Nearfield Instruments will deploy its flagship system, QUADRA, at Imec’s advanced R&D facility in Leuven. The two organizations will jointly develop next-generation metrology solutions to address critical challenges across the semiconductor manufacturing value chain, including: High-NA EUV Lithography Metrology Development and characterization of high-NA EUV resist 3D metrology using Nearfield’s proprietary High-Aspect-Ratio (HAR) imaging mode (FFTP) to improve scanner productivity.