Nearfield Instruments Signs Multi-Year Development Project to Advance Semiconductor Metrology
ROTTERDAM, The Netherlands, Nov. 18, 2025 (GLOBE NEWSWIRE) — Nearfield Instruments, the leader in 3D, non-destructive, in-line process control solutions based on scanning probe technology, today announced a strategic development project to accelerate innovation in semiconductor metrology. As part of a multi-year collaboration, Nearfield Instruments will deploy its flagship system, QUADRA, at Imec’s advanced R&D facility in Leuven. The two organizations will jointly develop next-generation metrology solutions to address critical challenges across the semiconductor manufacturing value chain, including: High-NA EUV Lithography Metrology Development and characterization of high-NA EUV resist 3D metrology using Nearfield’s proprietary High-Aspect-Ratio (HAR) imaging mode (FFTP) to improve scanner productivity.
